Fully Automatic Organic Stripper Cleaning Machine
SEMCTCEH specializes in the integrated development, production and sales of wet process equipment.
Fully Automatic Organic Photoresist Stripper
| Item | Specification |
| Applicable Workpiece | 8-12 inch wafer strip cleaning |
| Batch Capacity | 8~12 inch 13/25 pcs/batch |
| Process Flow | FOUP → EFM → Stripping → IPA → QDR → QDR → DRYING → EFM → FOUP |
| Main Materials | SUS frame + SUS shell plate, tank made of SUS316L Quartz/PVDF/PTFE material |
| Transfer Method | Robot arm transfer |
| Cycle Time | Adjustable from 5~10 minutes according to process requirements |
| Process Performance | Stripping efficiency ≥99% |
| Other Description | This equipment can be customized to manual/semi-automatic operation according to customer requirements |
